SH Products are silicon containing Bottom Anti-Reflective Coatings (SiBARC) and hard masks. These are designed to fill the narrowest gaps, improve 248nm KrF and ArF lithography and plasma etch processes via excellent etch selectivity and tailored optical properties. Our methodologies in manufacturing enable products with needed shelf life stabilities, and variable silicon content for desired etch selectivity. For selected materials we can produce the materials with less than 5ppb total trace metals. SH products for advanced nodes are developed together with our partner organization.
SH Products are compatible for damascene patterning and can be removed using commercial low damage strippers.
|SH 248D Properties|
|n (@ 248 nm)||1.52 - 1.54|
|k (@248 nm)||0.37 - 0.41|
|Particles at 0.3 um||<15|
|Particles at 0.2 um||<30|
|Total trace metals||<5-10 ppb|